Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 16, 2008
Patent Application Number
11871876
Date Filed
October 12, 2007
Patent Primary Examiner
Patent abstract
A semiconductor device capable of suppressing void migration is provided. The semiconductor device includes a dummy region extending in a first direction substantially perpendicular to a second direction in which a word line extends. In addition, an isolation layer pattern may not cut the dummy region in the second direction. Consequently, leaning of the dummy region and void migration are prevented. A method of fabricating the semiconductor device is also provided.
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