Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Maurits Van Der Schaar1
Richard Johannes Franciscus Van Haren1
Sami Musa1
Date of Patent
December 2, 2008
1Patent Application Number
113894941
Date Filed
March 27, 2006
1Patent Citations Received
Patent Primary Examiner
Patent abstract
An alignment tool for a lithographic apparatus illuminates an alignment mark on a substrate with an alignment beam and measures the reflected spectrum. The reflected spectrum is compared with a reference mark to determine any misalignment. A blazed sub-wavelength grating is used to deflect the sub-beams created by diffracting the alignment beam from the alignment mark onto the reference mark.
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