Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 11, 2008
Patent Application Number
11270000
Date Filed
November 9, 2005
Patent Primary Examiner
Patent abstract
Systems and techniques for laser metrology. A system may include a laser source and a fanning apparatus configured to generate a fanned laser beam. The fanned laser beam may be scanned across the surface of an object, and may reflect off a plurality of targets positioned on the surface. A position detection module may determine a position of the metrology targets based on the reflected beam.
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