Patent attributes
An integrated etched multilayer grating-based wavelength multiplexer/demultiplexer is disclosed wherein an etched multilayer grating structure is monolithically integrated within the optical waveguide stack of the multiplexer/demultiplexer to reflectively diffract an input optical beam. The multilayer grating structure is generally comprised of a series of etched diffractive elements and an etched multilayer reflector, the combined optical response of which providing the desired multiplexing/demultiplexing effect. The etched structures are generally comprised of shallow etch structures in a top surface of the multiplexer/demultiplexer waveguide stack. Monolithically integrated input and output ridge waveguides may also be provided, optionally fabricated in a same etching step as the etched multilayer grating.
