Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Woonghyun Choi0
Heung Cho Ko0
Hoosung Lee0
Suk-ho Kim0
Bongjin Moon0
Date of Patent
November 4, 2008
0Patent Application Number
112547590
Date Filed
October 21, 2005
0Patent Primary Examiner
Patent abstract
The present invention relates to pyrrole derivatives and photosensitive film using the same and more particularly, the pyrrole derivatives consist of pyrrole units to allow polymerization chemically and electrochemically and a perylene diimide unit to absorb light so that perylene diimide film can be produced by crosslinking the pyrrole units by irradiation of visible light having wavelengths longer than 500 nm and become insoluble in most solvents. Such perylene diimide films can be widely used in the manufacture of electrical, electronical and optical devices such as photo diodes, solar batteries, liquid crystal displays, and luminescent diodes, etc.
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