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US Patent 7446160 Phosphorus-containing cured benzoxazine resins and preparation thereof

Patent 7446160 was granted and assigned to National Cheng Kung University on November, 2008 by the United States Patent and Trademark Office.

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Patent Inventor Names
Chi Yi Lin0
Chun Shan Wang0
Jeng Yueh Shieh0
Wan Jung Hsieh0
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Patent abstract

A series of novel phosphorus-containing cured benzoxazine resins, which are synthesized from dihydrobenzoxazine resins with reactive phosphorus-containing compounds. The cured benzoxazine resins have desired flame retardancy and high glass transition temperature, and are suitable for the fabrication of printed circuit board and the semiconductor encapsulant applications.

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US Patent 07446160 Phosphorus-containing cured benzoxazine resins and preparation thereof US Patent 7446160 Phosphorus-containing cured benzoxazine resins and preparation thereof

Infobox
Patent Number
074461600
Patent Number
74461600
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=074461600
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Infobox
Is a
Patent
Patent
0
Current Assignee
National Cheng Kung University
National Cheng Kung University
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
074461600
Date of Patent
November 4, 2008
0
Patent Application Number
111045350
Date Filed
April 13, 2005
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=074461600
Patent Primary Examiner
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Duc Truong
0
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=07446160
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 US Patent 07446160 Phosphorus-containing cured benzoxazine resins and preparation thereof

Infobox
Is a
Patent
Patent
Current assignee
National Cheng Kung University
National Cheng Kung University
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
07446160
Date of patent
November 4, 2008
Patent application number
11104535
Date Filed
April 13, 2005
Patent primary examiner
‌
Duc Truong

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