Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Matthias Krönke0
Laura Lazar0
Date of Patent
October 21, 2008
0Patent Application Number
104635650
Date Filed
June 16, 2003
0Patent Primary Examiner
Patent abstract
A method for structuring a silicon layer applies lacquer mask onto the silicon layer, and the silicon layer is selectively etched relative to the lacquer mask using an etching gas mixture comprising SF6, HBr and He/O2. The openings etched into the silicon layer with this method comprise especially steep sidewalls. Over and above this, the etching selectivity relative to a lacquer mask is clearly improved.
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