Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 7, 2008
Patent Application Number
11605615
Date Filed
November 27, 2006
Patent Primary Examiner
Patent abstract
An improved apparatus and method for substrate layer deposition in which substrate layers are grown by carrier gas delivery of sequential pulses of reactants to the substrate surface. At least one of the reactants comprises excited species, e.g., radicals. In a specific embodiment, the apparatus of this invention provides sequential repeated pulses of reactants in a flow of carrier gas for reaction at a substrate surface. The reactant pulses are delivered with sufficient intervening delay times to minimize undesirable reaction between reactants in adjacent pulses in the gas phase or undesired uncontrolled reactions on the substrate surface.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
