Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 23, 2008
Patent Application Number
11563498
Date Filed
November 27, 2006
Patent Primary Examiner
Patent abstract
A measurement method measures a wavefront aberration of a target optical system using an interference pattern formed by lights from first and second image side slits. The first image side slit has a width equal to or smaller than a diffraction limit of the target optical system. The measurement method includes the steps of obtaining a first and second wavefronts having wavefront aberration information of the target optical system in ±45° directions relative to the polarization direction of the light, and calculating wavefront aberration of the target optical system based on the first and second wavefronts of the target optical system obtained by the obtaining step.
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