Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ryouichirou Naitou0
Takeshi Shimoaoki0
Date of Patent
September 2, 2008
0Patent Application Number
116524970
Date Filed
January 12, 2007
0Patent Primary Examiner
Patent abstract
A rinsing process is performed by supplying a rinsing liquid onto a substrate with a light-exposed pattern formed thereon and treated by a developing process. The rinsing liquid contains a polyethylene glycol family surfactant or an acetylene glycol family surfactant in a critical micelle concentration or less. Preferably, the surfactant includes a hydrophobic group having a carbon number of larger than 11 and having no double bond or triple bond therein.
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