US Patent 7419773 Rinsing method and developing method

Patent 7419773 was granted and assigned to Tokyo Electron on September, 2008 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Tokyo Electron

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

74197730

Patent Inventor Names

Ryouichirou Naitou0

Takeshi Shimoaoki0

Date of Patent

September 2, 2008

Patent Application Number

116524970

Date Filed

January 12, 2007

Patent Primary Examiner

‌

Hoa V Le

Patent abstract

A rinsing process is performed by supplying a rinsing liquid onto a substrate with a light-exposed pattern formed thereon and treated by a developing process. The rinsing liquid contains a polyethylene glycol family surfactant or an acetylene glycol family surfactant in a critical micelle concentration or less. Preferably, the surfactant includes a hydrophobic group having a carbon number of larger than 11 and having no double bond or triple bond therein.