Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 2, 2008
Patent Application Number
11202492
Date Filed
August 12, 2005
Patent Citations Received
Patent Primary Examiner
Patent abstract
A plasma CVD film formation apparatus includes: a reaction chamber; a shower plate installed inside the reaction chamber; and a susceptor for placing a wafer thereon installed substantially parallel to and facing the shower plate. The shower plate has a surface facing the susceptor, which is configured using a convex shape toward a center as a basic shape and overlaying at least one equation thereon, and the susceptor supports the wafer at a peripheral portion and at a position between a central portion and the peripheral portion.
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