Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Kazuyuki Nitta0
Date of Patent
August 5, 2008
0Patent Application Number
112397810
Date Filed
September 29, 2005
0Patent Primary Examiner
Patent abstract
A resist developer capable of forming a high resolution resist pattern with good shape and little film thinning is provided, together with a resist pattern formation method using such a developer. The resist developer is an aqueous solution comprising an ammonium hydroxide represented by a general formula (I): R1nR24-nN+.OH− wherein R1 is a lower alkyl group in which the number of carbon atoms is A, R2 is a lower alkyl group in which the number of carbon atoms is B, A<B, and n is an integer from 1 to 3.
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