US Patent 7393624 Negative resists based on acid-catalyzed elimination of polar molecules
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The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.
US Patent 07393624 Negative resists based on acid-catalyzed elimination of polar molecules US Patent 7393624 Negative resists based on acid-catalyzed elimination of polar molecules
US Patent 07393624 Negative resists based on acid-catalyzed elimination of polar molecules
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