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US Patent 7387923 ISFET using PbTiO

Patent 7387923 was granted and assigned to National Yunlin University of Science and Technology on June, 2008 by the United States Patent and Trademark Office.

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Current Assignee
National Yunlin University of Science and Technology
National Yunlin University of Science and Technology
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
73879230
Patent Inventor Names
Wen Yuan Liu0
Jung-Chuan Chou0
Wen Bin Hong0
Date of Patent
June 17, 2008
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Patent Application Number
112556560
Date Filed
October 21, 2005
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Patent Primary Examiner
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Carl Whitehead, Jr.
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Patent abstract

A PbTiO3/SiO2-gated ISFET device comprising a PbTiO3 thin film as H+-sensing film, and a method of forming the same. The PbTiO3 thin film is formed through a sol-gel process which offers many advantages, such as, low processing temperature, easy control of the composition of the film and easy coating over a large substrate. The PbTiO3/SiO2 gated ISFET device of the present invention is highly sensitive in aqueous solution, and particularly in acidic aqueous solution. The sensitivity of the present ISFET ranges from 50 to 58 mV/pH. In addition, the disclosed ISFET has high linearity. Accordingly, the disclosed ISFET can be used to detect effluent.

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