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US Patent 7378217 Antireflective hardmask composition and methods for using same

Patent 7378217 was granted and assigned to Cheil Industries on May, 2008 by the United States Patent and Trademark Office.

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Patent abstract

Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include:(a) a polymer component including at least one polymer having a monomeric unit of Formula (I)

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