US Patent 7365827 Lithographic apparatus and device manufacturing method
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Patent abstract
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
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US Patent 07365827 Lithographic apparatus and device manufacturing method US Patent 7365827 Lithographic apparatus and device manufacturing method
Infobox
Patent Number
0736582700
Patent Number
736582700
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Is a
Patent Jurisdiction
Patent Number
073658270
Date of Patent
April 29, 2008
0Patent Application Number
110065500
Date Filed
December 8, 2004
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
073658270
Date of Patent
April 29, 2008
0Patent Application Number
110065500
Date Filed
December 8, 2004
0Official Website
Patent Primary Examiner
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US Patent 07365827 Lithographic apparatus and device manufacturing method
Infobox
Is a
Patent jurisdiction
Patent number
07365827
Date of patent
April 29, 2008
Patent application number
11006550
Date Filed
December 8, 2004
Patent primary examiner
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