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US Patent 7311943 Templated monolayer polymerization and replication

Patent 7311943 was granted and assigned to Massachusetts Institute of Technology on December, 2007 by the United States Patent and Trademark Office.

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Current Assignee
Massachusetts Institute of Technology
Massachusetts Institute of Technology
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7311943
Date of Patent
December 25, 2007
Patent Application Number
10621897
Date Filed
July 17, 2003
Patent Citations Received
‌
US Patent 11747532 Laminated optical products and methods of making them
Patent Primary Examiner
‌
William Phillip Fletcher, III
Patent abstract

A self-replicating monolayer system employing polymerization of monomers or nanoparticle ensembles on a defined template provides a method for synthesis of two-dimensional single molecule polymers. Systems of self-replicating monolayers may be used as templates for the growth of inorganic colloids. A preferred embodiment is a SAM-based replication, wherein an initial monolayer is patterned and used as a template for self-assembly of a second monolayer by molecular recognition. Once the second monolayer has formed, it is polymerized in place and the two monolayers are separated to form a replicate. Both monolayers may then function as templates for monolayer assemblies. A generic self-replicating monomer unit suitable for use in one embodiment comprises a polymerizable moiety attached by methylene repeats to a recognition element and an ending unit that will not interfere with the chosen recognition chemistry. The recognition element is self-complementary, unless a set of two replicating monomers with compatible cross-linking chemistry is employed. In a two-component replication system utilizing two different kinds of recognition chemistries, the initial template undergoes replication cycles, while maintaining the two-dimensional segregation of the two types of monomers. During subsequent replications, the component domains experience little or no mixing, allowing the two-component, patterned assembly to be exponentially replicated. After replication, selective mineralization and/or electroless plating may produce a two-dimensional inorganic sheet having patterned domains within it.

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