Patent attributes
A pattern forming method for forming a functional film with a prescribed pattern on a substrate using a droplet discharge method, the pattern forming method includes: a sub region configuration process for: configuring, in a design pattern of the functional film, a plurality of sub regions which divide the designing pattern; and categorizing the plurality of sub regions into a plurality of non-adjacent groups; a first drawing process for arranging the liquid substance so as to draw a sub region that belongs to a first group categorized in the sub region configuration process; and a second drawing process for arranging the liquid substance so as to draw a sub region that belongs to a second group categorized in the sub region configuration process; wherein a solidification process for solidifying the liquid substance arranged in the first drawing process is provided between the first drawing process and the second drawing process.
