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US Patent 7288482 Silicon nitride etching methods
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Is a
Patent
Date Filed
May 4, 2005
Date of Patent
October 30, 2007
Patent Application Number
10908252
Patent Citations Received
US Patent 11682560 Systems and methods for hafnium-containing film removal
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US Patent 11915950 Multi-zone semiconductor substrate supports
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US Patent 12009228 Low temperature chuck for plasma processing systems
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US Patent 12027410 Edge ring arrangement with moveable edge rings
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Patent Inventor Names
Richard Wise
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Kamatchi Subramanian
0
Srikanteswara Dakshina Murthy
0
Siddhartha Panda
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
7288482
Patent Primary Examiner
Michael Lebentritt
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