Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 11, 2007
Patent Application Number
10941950
Date Filed
September 16, 2004
Patent Primary Examiner
Patent abstract
The present invention provides a method of increasing designing freedom of a position to form a capacitor, and increasing a capacitance value thereof. When forming a first contact, a tungsten plug for increasing a surface area of a lower electrode is formed in a contact interlayer film at a region where the capacitor is to be formed. Since the tungsten plug does not have to be formed right above the capacitor contact, a position to form the capacitor is not limited by a position where the capacitor contact is provided.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
