Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Seiichiro Okuda0
Shuichi Yasuda0
Takuya Kuroda0
Hiroaki Sugimoto0
Kenya Morinishi0
Masanobu Sato0
Masayoshi Imai0
Sadao Hirae0
Date of Patent
September 11, 2007
Patent Application Number
10836283
Date Filed
May 3, 2004
Patent Primary Examiner
Patent abstract
The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
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