US Patent 7237915 Catadioptric projection system for 157 nm lithography

Patent 7237915 was granted and assigned to Carl Zeiss SMT on July, 2007 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Carl Zeiss SMT

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7237915

Date of Patent

July 3, 2007

Patent Application Number

10771986

Date Filed

February 3, 2004

Patent Citations Received

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US Patent 11754809 Optical assembly for a wide field of view point action camera with low field curvature

Patent Primary Examiner

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Stephone B. Allen

Patent abstract

A photolithographic reduction projection catadioptric objective includes a first optical group G1 including an even number of at least four mirrors M1–M6; and a second at least substantially dioptric optical group G2 imageward than the first optical group G1 including a number of lenses E4–E13. The first optical group G1 provides compensative axial aberrative correction for the second optical group G2 which forms an image with a numerical aperture of at least substantially 0.65, and preferably at least 0.70 or 0.75. Six mirror examples are shown.