US Patent 7229563 Plasma etching of Ni-containing materials
Patent 7229563 was granted and assigned to Tokyo Electron on June, 2007 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
January 28, 2003
Date of Patent
June 12, 2007
Patent Application Number
10501987
Patent Jurisdiction
Patent Number
Patent Primary Examiner
Find more entities like US Patent 7229563 Plasma etching of Ni-containing materials
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
By using this site, you agree to our Terms of Service.