Patent attributes
Embodiments of the invention relate to a substrate processing chamber. In one embodiment a substrate processing chamber includes a chamber body containing a substrate support, a lid assembly comprising an expanding channel extending from a central portion of the lid assembly to a peripheral portion of the lid assembly and positioned to substantially cover the substrate support, and one or more valves adapted to provide one or more reactants into the chamber body. The valves comprising a valve body having at least two ports comprising a purge inlet and an outlet, a valve seat surrounding one of the ports, an annular groove formed around the valve seat coupling the purge inlet and the outlet, and a diaphragm assembly. The diaphragm assembly comprises a diaphragm movable to contact the valve seat, a piston coupled to the diaphragm, and a cylinder to house the piston.
