Patent attributes
An electrostatic discharge protection device, including a silicon-control-rectifier, in complementary metal-oxide semiconductor (CMOS) process is disclosed. in one embodiment of the present invention, the protection device includes a semiconductor substrate having a first conductivity type. A well region formed with a second conductivity type in the semiconductor substrate. A first region formed in the well region. A second region formed having a portion in the weil region and another portion outside the well region, but still within the semiconductor substrate. Moreover, a third region formed within the well region and in between the first; region and the second region. A fourth region formed within the semiconductor substrate and outside the well region. A fifth region formed within the semiconductor substrate and in between the second region and the fourth region. Furthermore, the second region and the fifth region form the n+-p+ junction of a zener diode and the breakdown voltage of the zener diode is controlled by adjusting the ion dosage in the second region.
