Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
William R. Tonti0
Carl Radens0
Richard Q. Williams0
Toshiharu Furukawa0
Date of Patent
May 15, 2007
0Patent Application Number
111823810
Date Filed
July 15, 2005
0Patent Primary Examiner
Patent abstract
The present invention provides an epitaxial imprinting process for fabricating a hybrid substrate that includes a bottom semiconductor layer; a continuous buried insulating layer present atop said bottom semiconductor layer; and a top semiconductor layer present on said continuous buried insulating layer, wherein said top semiconductor layer includes separate planar semiconductor regions that have different crystal orientations, said separate planar semiconductor regions are isolated from each other. The epitaxial printing process of the present invention utilizing epitaxial growth, wafer bonding and a recrystallization anneal.
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