US Patent 7202177 Nitrous oxide stripping process for organosilicate glass

Patent 7202177 was granted and assigned to Lam Research on April, 2007 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Lam Research

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7202177

Date of Patent

April 10, 2007

Patent Application Number

10680895

Date Filed

October 8, 2003

Patent Primary Examiner

‌

Thanh Nguyen

Patent abstract

A method of stripping an integrated circuit (IC) structure having a photoresist material and an organosilicate glass (OSG) material is described. The method comprises feeding a nitrous oxide (N2O) gas into a reactor, generating a plasma in the reactor and stripping the photoresist. The stripping process provides a high selectivity between the photoresist and the OSG material.