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US Patent 7196775 Patterned mask holding device and method using two holding systems

Patent 7196775 was granted and assigned to ASML Holding on March, 2007 by the United States Patent and Trademark Office.

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Patent
Patent

Patent attributes

Current Assignee
ASML Holding
ASML Holding
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7196775
Patent Inventor Names
Daniel N. Galburt1
Date of Patent
March 27, 2007
Patent Application Number
10922862
Date Filed
August 23, 2004
Patent Primary Examiner
‌
Peter B. Kim
Patent abstract

A system and method that eliminate or substantially reduce slippage of a pattern generator with respect to a pattern generator holding device during a scanning portion of an exposure operation. In first and second examples, this is done by either (a) continuously or (b) when needed concurrently using first and second pattern generator holding systems to hold the pattern generator to the pattern generator holding device. In these examples, the first pattern generator holding systems utilizes an electrostatic system to attract the pattern generator to the pattern generator holding device and the second pattern generator holding system utilizes a vacuum system to attract the pattern generator to the pattern generator holding device.

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