Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
February 13, 2007
Patent Application Number
10863148
Date Filed
June 7, 2004
Patent Primary Examiner
Patent abstract
A chemical mechanical polishing apparatus includes a polishing pad. A pad conditioner includes a static conditioner head having a surface area configured to contact and condition the pad. The surface area has a first end proximate to an axis of rotation of the pad and a second end remote from the axis of rotation of the pad. The first end defines a first arc length, and the second end defines a second arc length, where the first arc length and the second arc length are substantially identical.
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