Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 30, 2007
0Patent Application Number
111796060
Date Filed
July 13, 2005
0Patent Primary Examiner
Patent abstract
A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.
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