US Patent 7165566 Method of forming a microstructure using maskless lithography

Patent 7165566 was granted and assigned to Wisconsin Alumni Research Foundation on January, 2007 by the United States Patent and Trademark Office.

Overview Structured Data Issues Contributors Activity

Is a

Patent

Patent attributes

Current Assignee

Wisconsin Alumni Research Foundation

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7165566

Date of Patent

January 23, 2007

Patent Application Number

10422237

Date Filed

April 24, 2003

Patent Primary Examiner

‌

A. Michael Chambers

Patent abstract

A method is provided for fabricating a microstructure using maskless lithography. A first layer is provided in a spaced relationship to a base layer so as to define a construction cavity therebetween. The first layer has a passageway therethrough that communicates with the construction cavity. The construction cavity is filled with material and a polymerizing agent is directed towards a portion of the material so as to polymerize the same. The polymerized material defines a channel network and the non-polymerized material is flushed from the channel network.