Patent attributes
A semiconductor device comprises a semiconductor substrate; an embedded insulating layer provided on the semiconductor substrate; a semiconductor layer provided on the embedded insulating layer; a transistor including a first conductivity type source layer formed within the semiconductor layer, a first conductivity type drain layer formed in the semiconductor layer, and a channel forming region between the source layer and the drain layer; and an embedded insulating layer protective diode including a second conductivity type first diffusion layer and a first conductivity type second diffusion layer, the first diffusion layer being at the same potential as a semiconductor substrate region immediately below the channel forming region, the second diffusion layer being provided adjacently to the first diffusion layer and electrically connected to at least one of the source layer, the drain layer and the channel forming region.
