Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 5, 2006
Patent Application Number
11328575
Date Filed
January 10, 2006
Patent Primary Examiner
Patent abstract
The invention is directed to a vertically emitting laser and a method of manufacturing such a laser having a current aperture and a semiconductor relief. The semiconductor relief and the current aperture are defined in the same processing operation, thereby causing the semiconductor relief and the current aperture to be substantially self-aligned with respect to one another. In addition, such processing results in an area ratio of the semiconductor relief and the current aperture to be substantially self-scaling with respect to processing variations.
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