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US Patent 7136214 Active faceted mirror system for lithography

Patent 7136214 was granted and assigned to ASML Holding on November, 2006 by the United States Patent and Trademark Office.

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Patent
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Patent attributes

Current Assignee
ASML Holding
ASML Holding
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
71362140
Patent Inventor Names
Erik Loopstra0
Stephen Roux0
Date of Patent
November 14, 2006
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Patent Application Number
109860760
Date Filed
November 12, 2004
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Patent Primary Examiner
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Mark A. Robinson
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Patent abstract

An active faceted mirror system is disclosed. The active faceted mirror system includes a set of active facet mirror devices, a base plate and a set of pins for mounting the active facet mirror devices to the base plate. Each of the active facet mirror devices includes a mirror substrate with a reflective surface and a bearing hole on the reverse side for mounting. Additionally, each of the active facet mirror devices includes at least three actuator targets located on the back side of the mirror substrate, a jewel bearing and a flexure for supporting the mirror substrate. The base plate includes a series of bearing holes for mounting the active facet mirror devices and at least three actuators for each of the active facet mirror devices. A set of facet controllers located on the base plate can be used to control the positioning of the active facet mirror devices to produce a desired illumination effect.

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