US Patent 7132363 Stabilizing fluorine etching of low-k materials

Patent 7132363 was granted and assigned to Advanced Micro Devices on November, 2006 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Advanced Micro Devices

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7132363

Date of Patent

November 7, 2006

Patent Application Number

09817056

Date Filed

March 27, 2001

Patent Primary Examiner

‌

Thanh Nguyen

Patent abstract

Damascene processing is implemented with dielectric barrier films (50, 90, 91) for improved step coverage and reduced contact resistance. Embodiments include the use of two different dielectric films (50, 31) to avoid misalignment problems. Embodiments further include dual damascene (100A, 100B) processing using Cu metallization (100).