US Patent 7121919 Chemical mechanical polishing system and process
Patent 7121919 was granted and assigned to Micron Technology on October, 2006 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
August 30, 2001
0
Date of Patent
October 17, 2006
0
Patent Application Number
09944983
0
Patent Inventor Names
Paul A. Farrar
0
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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