US Patent 7115533 Semiconductor device manufacturing method
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Patent Inventor Names
Kazuhiko Yamamoto0
Shigenori Hayashi0
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Article
Patent abstract
The present invention provides a method of depositing a metal film on a substrate in a non-oxidizing atmosphere and then forming a metal oxide film by oxidizing the metal film in an oxidizing atmosphere.
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US Patent 07115533 Semiconductor device manufacturing method US Patent 7115533 Semiconductor device manufacturing method
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Patent Number
071155330
Patent Number
71155330
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Official Website
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Patent Jurisdiction
Patent Number
071155330
Date of Patent
October 3, 2006
0Patent Application Number
103196540
Date Filed
December 16, 2002
0Official Website
Patent Primary Examiner
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US Patent 07115533 Semiconductor device manufacturing method
Infobox
Is a
Patent jurisdiction
Patent number
07115533
Date of patent
October 3, 2006
Patent application number
10319654
Date Filed
December 16, 2002
Patent primary examiner
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