Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Youichi Ohsawa0
Katsuhiro Kobayashi0
Kazunori Maeda0
Yoshitaka Yanagi0
Date of Patent
September 19, 2006
0Patent Application Number
107761590
Date Filed
February 12, 2004
0Patent Primary Examiner
Patent abstract
A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.
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