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US Patent 7106415 Illumination compensator for curved surface lithography

Patent 7106415 was granted and assigned to Anvik Corporation on September, 2006 by the United States Patent and Trademark Office.

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Current Assignee
‌
Anvik Corporation
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7106415
Date of Patent
September 12, 2006
Patent Application Number
10731187
Date Filed
December 9, 2003
Patent Primary Examiner
‌
Henry Hung Nguyen
Patent abstract

A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.

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