US Patent 7098068 Method of forming a chalcogenide material containing device

Patent 7098068 was granted and assigned to Micron Technology on August, 2006 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Micron Technology

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7098068

Date of Patent

August 29, 2006

Patent Application Number

10796109

Date Filed

March 10, 2004

Patent Primary Examiner

‌

Asok Kumar Sarkar

Patent abstract

Embodiments of the invention provide a method of forming a chalcogenide material containing device, and particularly resistance variable memory elements. A stack of one or more layers is formed over a substrate. The stack includes a layer of chalcogenide material and a metal, e.g., silver, containing layer. A protective layer is formed over the stack. The protective layer blocks light, is conductive, and is etchable with the other layers of the stack. Further, the metal of the metal containing layer is substantially insoluble in the protective layer. The stack and the protective layer are then patterned and etched to form memory elements.