Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
August 15, 2006
Patent Application Number
10387769
Date Filed
March 13, 2003
Patent Primary Examiner
Patent abstract
A method of patterning self-assembled thin films, including forming a photoresist layer on a substrate and then patterning and etching the photoresist layer. In combination with the etched photoresist layer, a self-assembled layer is formed on the substrate using LbL self-assembly.
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