US Patent 7070405 Alignment systems for imprint lithography
Patent 7070405 was granted and assigned to Molecular Imprints on July, 2006 by the United States Patent and Trademark Office.
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Patent abstract
Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid. Multiple optical imaging devices are used to align the template with the substrate.
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Patent Inventor Names
Byung Jin Choi0
Michael P. C. Watts0
Norman E. Schumaker0
Ronald D. Voisin0
Sidlgata V Sreenivasan0
Date of Patent
July 4, 2006
0Patent Application Number
102108940
Date Filed
August 1, 2002
0Patent Primary Examiner
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US Patent 7070405 Alignment systems for imprint lithography
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