US Patent 6972478 Integrated circuit and method for its manufacture
Patent 6972478 was granted and assigned to Advanced Micro Devices on December, 2005 by the United States Patent and Trademark Office.
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An integrated circuit and methods for its manufacture are provided. The integrated circuit comprises a bulk silicon substrate having a first region of <100> crystalline orientation and a second region of <110> crystalline orientation. A layer of silicon on insulator overlies a portion of the bulk silicon substrate. At least one field effect transistor is formed in the layer of silicon on insulator, at least one P-channel field effect transistor is formed in the second region of <110> crystalline orientation, and at least one N-channel field effect transistor is formed in the first region of <100> crystalline orientation.
US Patent 6972478 Integrated circuit and method for its manufacture
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