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US Patent 6920312 RF generating system with fast loop control

Patent 6920312 was granted and assigned to Lam Research on July, 2005 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Patent Applicant
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Current Assignee
Lam Research
Lam Research
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
69203120
Patent Inventor Names
Neil Benjamin0
Date of Patent
July 19, 2005
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Patent Application Number
100381330
Date Filed
January 2, 2002
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Patent Citations Received
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US Patent 12020902 Plasma processing with broadband RF waveforms
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US Patent 11978613 Transition control in a bias supply
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US Patent 12125674 Surface charge and power feedback and control using a switch mode bias system
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US Patent 11842884 Spatial monitoring and control of plasma processing environments
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US Patent 11887812 Bias supply with a single controlled switch
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US Patent 11942309 Bias supply with resonant switching
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Patent Primary Examiner
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Marceau Milord
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Patent abstract

An RF generating system operates with high efficiency to supply RF output power to a plasma load. The RF generating system is capable of modulating the RF output power at frequencies up to the frequency of the RF output power while maintaining high efficiency operation. Broadband frequency modulation of the RF output power suppresses instabilities thereby minimizing unstable behavior of the plasma load.

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