US Patent 6880402 Deposition monitoring system
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Patent abstract
Described is an apparatus for detecting and removing deposits from a surface exposed to wellbore fluids. The apparatus can monitor the rate of deposition and subsequently remove the deposited material. The combination of detection apparatus and removal apparatus provides an instrument with self-cleaning operation mode.
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Patent Inventor Names
Benoit Couet0
Timothy Gareth John Jones0
Date of Patent
April 19, 2005
0Patent Application Number
100887230
Date Filed
October 26, 2000
0Patent Primary Examiner
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US Patent 6880402 Deposition monitoring system
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