US Patent 6873112 Method for producing a semiconductor device
Patent 6873112 was granted and assigned to Lam Research on March, 2005 by the United States Patent and Trademark Office.
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Patent abstract
The invention provides a method, for processing a substrate. The substrate is placed in a chamber, where the chamber comprises a substrate holder within the chamber and a dielectric window forming a side of the chamber. A gas is provided into the chamber. An antenna is used to generate an azimuthally symmetric electric field. A substantially azimuthally symmetric plasma is formed from the gas using the azimuthally symmetric electric field. A substantially uniform process rate is produced across a surface of a substrate.
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Patent Inventor Names
Andrew D. Bailey, III0
Mark H. Wilcoxson0
Date of Patent
March 29, 2005
0Patent Application Number
107791870
Date Filed
February 13, 2004
0Patent Primary Examiner
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US Patent 6873112 Method for producing a semiconductor device
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