Is a
Patent attributes
Patent Applicant
0
Patent Jurisdiction
Patent Number
Patent Inventor Names
Norio Ishikawa0
Takuo Oowada0
Date of Patent
March 8, 2005
0Patent Application Number
103097970
Date Filed
December 4, 2002
0Patent Citations Received
Patent Primary Examiner
Patent abstract
The object of the present invention is to provide, in the production of semiconductor circuit elements, a photoresist residue removing liquid composition which is excellent for removing photoresist residues after dry etching without attacking the wiring material or the interlayer insulating film etc.
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