US Patent 12120925 Descending etching resistance in advanced substrate patterning
Patent 12120925 was granted and assigned to Applied Materials on October, 2024 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
April 17, 2023
0
Date of Patent
October 15, 2024
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Patent Applicant
Patent Application Number
18301805
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Patent Citations
Patent Inventor Names
Ji Young Choung
0
Jungmin Lee
0
Yu-hsin Lin
0
Dieter Haas
0
Chung-chia Chen
0
Wen-Hao Wu
0
Si Kyoung Kim
0
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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