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US Patent 12111580 Optical metrology utilizing short-wave infrared wavelengths

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
April 29, 2021
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Date of Patent
October 8, 2024
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Patent Application Number
17243912
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Patent Citations
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US Patent 7879627 Overlay marks and methods of manufacturing such marks
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US Patent 9835956 Apparatus and method for overlay measurement
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US Patent 9921104 Simultaneous multi-angle spectroscopy
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US Patent 10042269 Apparatus and method for overlay measurement
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US Patent 10228320 Achieving a small pattern placement error in metrology targets
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US Patent 10444161 Systems and methods for metrology with layer-specific illumination spectra
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US Patent 10527951 Compound imaging metrology targets
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US Patent 10809632 Metrology apparatus and a method of determining a characteristic of interest
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US Patent 11346657 Measurement modes for overlay
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US Patent 11428642 Scanning scatterometry overlay measurement
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•••
Patent Inventor Names
Michael Shentcis
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Raviv Yohanan
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Eitan Hajaj
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Vladimir Levinski
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Etay Lavert
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Isaac Salib
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Avi Abramov
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Amnon Manassen
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Iftach Nir
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Shlomo Eisenbach
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•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
12111580
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Patent Primary Examiner
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Gordon J Stock, Jr.
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CPC Code
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G01B 11/272
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G01N 21/35
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G01N 21/956
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G01N 21/9501
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G01N 21/9505
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G03F 7/70608
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G03F 7/70616
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G03F 7/70625
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G03F 7/70633
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G03F 7/70641
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•••

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